JPH0217929B2 - - Google Patents

Info

Publication number
JPH0217929B2
JPH0217929B2 JP60281126A JP28112685A JPH0217929B2 JP H0217929 B2 JPH0217929 B2 JP H0217929B2 JP 60281126 A JP60281126 A JP 60281126A JP 28112685 A JP28112685 A JP 28112685A JP H0217929 B2 JPH0217929 B2 JP H0217929B2
Authority
JP
Japan
Prior art keywords
light
wafer
detection
resist
reflected
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60281126A
Other languages
English (en)
Japanese (ja)
Other versions
JPS62140420A (ja
Inventor
Haruna Kawashima
Takahiro Akamatsu
Hiroyoshi Kubo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP60281126A priority Critical patent/JPS62140420A/ja
Publication of JPS62140420A publication Critical patent/JPS62140420A/ja
Publication of JPH0217929B2 publication Critical patent/JPH0217929B2/ja
Priority to US07/657,950 priority patent/US5162642A/en
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • G03F9/7026—Focusing

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Optical Radar Systems And Details Thereof (AREA)
JP60281126A 1985-11-18 1985-12-16 面位置検知装置 Granted JPS62140420A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP60281126A JPS62140420A (ja) 1985-12-16 1985-12-16 面位置検知装置
US07/657,950 US5162642A (en) 1985-11-18 1991-02-21 Device for detecting the position of a surface

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60281126A JPS62140420A (ja) 1985-12-16 1985-12-16 面位置検知装置

Publications (2)

Publication Number Publication Date
JPS62140420A JPS62140420A (ja) 1987-06-24
JPH0217929B2 true JPH0217929B2 (en]) 1990-04-24

Family

ID=17634724

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60281126A Granted JPS62140420A (ja) 1985-11-18 1985-12-16 面位置検知装置

Country Status (1)

Country Link
JP (1) JPS62140420A (en])

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL9100410A (nl) * 1991-03-07 1992-10-01 Asm Lithography Bv Afbeeldingsapparaat voorzien van een focusfout- en/of scheefstandsdetectie-inrichting.
JP2016015371A (ja) * 2014-07-01 2016-01-28 ウシオ電機株式会社 厚さ測定装置、厚さ測定方法及び露光装置

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5760205A (en) * 1980-09-30 1982-04-12 Jeol Ltd Exposure be electron beam
JPS57139607A (en) * 1981-02-23 1982-08-28 Hitachi Ltd Position measuring equipment

Also Published As

Publication number Publication date
JPS62140420A (ja) 1987-06-24

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